A major technological breakthrough in China's chips, bypassing the EUV lithography machine, ASML was dumbfounded.
The United States believes that the restrictions on ASML EUV lithography equipment will have an adverse impact on China's integrated circuit industry, but China recently announced that its research and development department has developed a new type of lithography machine, which not only avoids EUV lithography machines, but also improves its performance several times, which is not a difficult thing for China's semiconductor industry.
Fudan University recently published an article in the journal Nature Electronics titled "Silicon and Molybdenum Disulfide Heterogeneous Complementary Field Effect Transistors", and proposed a new idea to convert existing silicon materials into semiconductor devices with double-gate structures, namely CFETs, which are hailed as the most cutting-edge semiconductor devices today, and their performance is expected to be doubled.
The key to improving the performance of the chip is to improve the performance of the chip, the past process is to further reduce the area of the chip, so that the same size of the chip can integrate more chips, but TSMC's latest FinFET process, because it is not applied to the chip, so the process efficiency is not greatly improved;The FinFET process can increase the interconnect performance to 16 nm, demonstrating the importance of chip technology.
Fudan University's CFET (CFETS) is used to replace FinFET and even the latest generation of GAAFET (GAAFETS), converting silicon (Si) devices into a stacked structure, which can improve the efficiency of the device to a certain extent, which is of great significance for China's current integrated circuit processing process.
China's existing 14 nm process is 14 nm process, and if it is combined with Fudan University's CFET process, the 14 nm process can reach the 7nm process level, which is enough to fill more than 90% of the process needs of the Chinese marketSMIC's 7 nm process, as well as advanced processes such as CFET, already have the capabilities of the 5 nm process, which is sufficient to meet 99% of the current market demand in the Chinese market.
The CFET lithography technology developed by Fudan University has enabled China to break through the bottleneck of the existing EUV lithography process, fundamentally solve the problem of chip manufacturing in China, and bring a heavy impact to ASML, because a wave of extreme ultraviolet lithography has been set off around the world.
In fact, it is not impossible to bypass EUV lithography, the first country in the world to break through EUV lithography technology is Japan, Japan's self-developed EUV lithography-free NIL technology can not only solve the requirements of packaged memory chips for device performance, but also significantly reduce production costs, so Japan is gradually advancing NIL technology to the 5 nm process, indicating that it is entirely possible for us to independently develop new process technology.
ASML is facing an embarrassing problem, that is, the United States has a great demand for the 1 beta process, but the United States Micron technology is bypassing the EUV lithography machine and developing the 1 beta process.
ASML's biggest profit** is the EUV lithography machine and the new generation of extreme ultraviolet lithography machine, once the demand for EUV lithography machine of major semiconductor companies decreases, ASML's most proud EUV lithography machine will also be reduced to a decoration, it can be said that ASML is now the intestines are green!He regretted it.
ASML once had a dream of "making a big profit", relying on its first batch of extreme ultraviolet lithography machines, relying on selling 120 million US dollars, ready to sell its second-generation extreme ultraviolet lithography machine to 40 million US dollars, the lithography machine gradually became a money printing machine, while China, Japan and the United States have avoided the EUV lithography machine, ASML's dream is completely shattered, and it will be the same as 2005, so you can only stare dryly!It's been a hard life.