Photoresist, as a key raw material in the semiconductor industry, plays an indispensable role as a painter's pigment. However, more than 90% of the world's photoresist** is controlled by Japanese companies, causing deep concern about China's chip industry. Under the cloud of the Sino-US science and technology war, China is facing huge challenges in the field of high-end chips, especially the constraints of the two key links of lithography machine and photoresist. U.S. repression and Japan's monopoly have made it difficult for China in this area.
In this era of technological competition and geopolitical games, China is catching up with the pace of the world's science and technology. However, photoresist, a small raw material, plays a decisive role. Looking back on history, the turmoil of the nib steel is still fresh in people's memories. Once, some people thought that China could not make nib steel, but this rumor was broken by a furnace of "nib steel" in Taiyuan Steel Mill.
This history teaches us that the challenge of technology is not a desperate situation, but a driving force that inspires innovation and forge ahead. Nowadays, photoresist has also become a battlefield for China's independent innovation in science and technology. The technological blockade of the United States and the monopoly of Japan have forced China to think about how to break this situation. Among Chinese technology companies, Huawei is a shining star.
In the face of chip supply cuts in the United States, Huawei quickly launched the spare tire program and launched the HarmonyOS system and self-developed 5G chips, like a ray of light in the difficult struggle. However, the complexities of the photoresist market cannot be solved overnight. More than 90% of photoresists** are monopolized by Japanese companies, and the shelf life of photoresists is only half a year, which increases the difficulty of China's self-sufficiency in this field.
The history of China's scientific and technological development has been full of twists and turns, advocating international cooperation and seeking external support on the one hand, and striving to firmly grasp the technology in its own hands on the other. Just like Huawei's performance in the chip field, independent research and development has become a top priority for China. The nib steel incident tells us that China has the ability to catch up in the field of technology. Some progress has also been made in domestic substitution efforts in the field of photoresists.
Nanda Optoelectronics and other enterprises have invested a lot of money in research and development, and successfully produced China's first ARF photoresist, which has been well received by the market. Suzhou Ruihong, Beijing Kehua and other enterprises have also achieved technological breakthroughs in the field of photoresist, looking for a new development path for China in this field. However, the road to domestic substitution is not smooth.
The photoresist market is small, but the competition is fierce on a global scale, and the specificity of photoresists makes substitution work more difficult. However, China has a huge market and human resources, and guidance and policy support can play a huge role. Under the wave of globalization, China needs to continuously improve its technological competitiveness and maintain its scientific and technological independence.
School-enterprise cooperation has become a shortcut to cultivating scientific research talents. It is an effective way for China to develop science and technology independently by establishing a closer combination of industry, academia and research between universities and enterprises and accelerating the application of knowledge in practice. ** Guidance and large capital investment are also indispensable. The establishment of industrial support provides a solution to the problem of chip neck, but in the field of photoresist, more policy support and R&D resources still need to be invested to accelerate the development of the industry.
The particularity of the photoresist market requires Chinese companies to be more innovative. It is a top priority for Chinese science and technology enterprises to overcome technical difficulties, improve the quality and performance of photoresist, and gradually replace imported products with domestic photoresist. Independent research and development of technology can not only solve external constraints, but also cultivate China's own technical talents and promote the continuous progress of the entire industry.
China is going further and further on the road of scientific and technological development, but it must also face more and more resistance. In international competition, independent research and development has become the foundation of Chinese science and technology enterprises. Just like the nib steel incident in history, China has the ability to break down technological barriers and move towards technological independence. In the field of photoresist, China will usher in new challenges and will also show a more distinctive style of scientific and technological independence.