Harbin Institute of Technology EUV research and development new stage, foreign media: Biden's plan is in vain.
Since China's science and technology came to the world"Stage"Later, US capitalism began to worry that in order to prevent its international dominance from being stolen by China, it often imposed restrictions on China's science and technology, especially in the field of semiconductors.
Now, Harbin Institute of Technology has announced new news, the development of domestic EUV lithography equipment has entered a new stage, and foreign countries have reported that Biden's plan has been"Failed", sanctions already"Fall"！
You must know that in 2018, the United States was worried that China's semiconductor chips were about to achieve strategic self-sufficiency, and began to take targeted restrictive measures.
The first restriction was the most advanced wafer fabrication equipment on the market at that time - EUV lithography technology, as a product of the research and development of the EUVLCC consortium, the former United States accounted for up to 30% of the basic technology, so they directly cut off the ** from the European continent.
As a result, domestic semiconductor equipment companies have been unable to mass-produce wafers with advanced process technology, even with the addition of SMIC's"Multi-technology"At present, it can only produce wafers with 7nm process, which is expensive.
But American capitalist"Ambition"It may not stop there, in recent years, not only has the semiconductor equipment from China continued to increase, but also imposed sanctions on many Chinese companies such as Huawei, Yangtze River Storage, ZTE, and Inspur.
Obviously, in order to make use of China's existing high-speed rail lines, armored machines, hand-cut steel and even"Tiangong space station"and other high-tech products, the United States can be described as"Unscrupulous"The earth is trying to stop China with its own calculations.
By the beginning of 2023, the United States has even invited Japan and the Netherlands to establish"U.S.-Japan-Netherlands Alliance", through China's sanctions in the field of lithography"Secret Protocol"China's ability to mass-produce mature process wafers is also under threat.
However, Biden and even Western countries did not expect that China's semiconductor field is developing so rapidly, in addition to the 90nm, 65nm, 45nm and 28nm chip manufacturing processes, the self-development of domestic lithography machines has also gradually succeeded.
Even the world monopoly of EUV lithography is in jeopardy, because just recently, HIT announced new information that once again shattered the self-confidence of the United States.
The president of ASML, which once dominated the channel of advanced process lithography machines, expressed concern, saying that China's self-developed lithography equipment is hurting the international semiconductor market.
Winninger once said that even if he handed over the EUV lithography design to the Chinese, he would not be able to make lithography equipment capable of producing advanced process chips.
Now it seems that the words of the president of ASML at that time were nothing more than a rigid attitude, and now that he sees the advance of the Chinese side, he finally begins to worry.
The innovative technology released by Harbin Institute of Technology this time is one of the key basic technologies of EUV lithography technology - electric energy conversion plasma line. With the support of this technology, the DPP-EUV light source required for EUV lithography can reach normal levels.
Thanks to the Harbin Institute of Technology (HIT) released in 2022"High-speed, ultra-precision laser interferometer"One of the three basic technologies of EUV lithography technology, the double table, has finally become a reality, and the main technical requirements are only objective lenses.
However, in 2021, Changchun Institute of Optics and Mechanics has mastered most of it"Optical projection lenses"technology, not long ago, a breakthrough was made to obtain a mirror that meets the EUV lithography standard with an error of less than 01 nm, up to the EUV standard.
Together with the mirror system developed in 2015, it prepares three basic technologies for the construction of advanced high-level wafer semiconductor processing equipment, which means that the arrival of a national EUV lithography machine is not far off.
This also means that China's EUV lithography machine research and development has entered a new stage, and Biden's desire to contain China's plans"Missed"Finish.
I have to say that although Harbin Institute of Technology is not as famous as Tsinghua University, Peking University and other well-known universities, as one of the seven sons of national defense, its contributions and achievements are definitely the best among universities in the country!
Therefore, I hope that students who are still preparing to apply for secondary school will fully consider HIT, study hard, and make greater contributions to the country in the future!