As transistors continue to shrink in size, wafer fabrication processes become more complex, and the requirements for semiconductor wet cleaning technology are increasing.
The cleaning process is an important link throughout the entire semiconductor manufacturing process, and it is one of the important factors affecting the performance and yield of semiconductor devices. In the chip manufacturing process, any contamination may affect the performance of semiconductor devices and even cause failure. Therefore, almost before and after almost every process of chip manufacturing, a cleaning process needs to be carried out to remove contaminants on the surface and ensure the cleanliness of the wafer surface, especially after polishing, etching and other processes, some impurities such as particles, metals, organic matter, and natural oxide layers will be attached to the wafer surface.
However, the cleaning object is ever-changing, and the types of materials that can be encountered are also very complex, and we cannot use one or two detergents to meet the cleaning safety of all materials, so the component design and product structure of the detergent must fully consider the material characteristics of the materials contained in different types of equipment to ensure that the detergent is used correctly and has no damage to the material of the cleaned object.
How to control the concentration of cleaning agents
The concentration of the cleaning agent has a great relationship with the cleaning effect, generally with the increase of concentration, the decontamination ability is also correspondingly enhanced, but after reaching a certain concentration, the decontamination ability is no longer significantly improved. Generally, the concentration should be controlled at 3%-5%.
ATAGO** Refractometer - CM-800
Directly installed in the production discharge pipeline, using the refractometric principle, the liquid brix value (soluble solids) in the pipeline is monitored in real time through the ** sensor, and the measurement accuracy is high (brix 0.).1%), with a wide measurement range (brix 0.).0～80.It has been widely used in food, biochemical, pharmaceutical, sugar, beverage, chemical and other industries, realizing multi-process concentration monitoring for stock solution, extraction, mixing, cleaning, etc., effectively ensuring the quality uniformity of products, and comprehensively improving the level of automated production of enterprises