As an indispensable core consumable in the chip manufacturing process, photoresist plays an important role in improving the quality of lithography and achieving independent control. However, for a long time, the photoresist market has been monopolized by Japan, which makes China have the risk of supply interruption in the photoresist chain. In order to reduce dependence on Japan, China's domestic photoresist is gradually breaking through and achieving corner overtaking. In this paper, we will discuss the classification of photoresists, the difficulties in the research and development of photoresists, and the efforts of domestic photoresists.
Photoresists can be divided into semiconductor photoresists, LED photoresists, LCD photoresists and PCB photoresists according to their application fields. Among them, semiconductor photoresist is the most challenging field. According to the advanced process, semiconductor photoresists are divided into EUV photoresists, ARF photoresists, KRF photoresists and IG-line photoresists, which correspond to specific lithography machines.
As a key material in the photolithography process, the development of photoresist is very difficult. First of all, photoresist is synthesized from a variety of chemical materials, and the development process requires continuous formulation adjustment. Formulations involve the selection and combination of hundreds of resins, photoacids, and additives, and require constant trial, validation, and tweaking to ensure that the final photoresist meets the needs. Secondly, the development of photoresist cannot be reversed simply by analyzing the composition of existing photoresists, because the cost of photoresist is related to the mixing ratio between materials, which cannot be directly analyzed. In addition, the purification of materials also has an impact on the development of photoresists, and even if the composition of certain materials is known, it is not possible to develop a mature photoresist if it cannot meet sufficiently high purity requirements.
For a long time, China's photoresist field has mainly focused on low-end products, which cannot meet the needs of high-end markets. However, in recent years, China's photoresist industry is picking up the pace and striving to make a breakthrough in domestic substitution.
Recently, Xuzhou Bokang, a domestic photoresist manufacturer, announced that its two wet photoresists are in the product verification and introduction stage, and can achieve photoresists of up to 14nm nodes**. In addition, they have launched 15 i-line photoresists, 30 KRF photoresists, and 26 ARF photoresists, which have the ability to replace many photoresists in Japan in China.
In order to achieve independent and controllable photoresist, China's domestic photoresist manufacturers need to make continuous efforts to improve the industrial chain and accelerate the pace of localization of the first chain. At the same time, as the process advances, the demand for high-end photoresists will also increase significantly. As the world's largest chip market, China has also set ambitious targets in terms of chip production capacity and self-sufficiency, and the demand for photoresist is bound to increase.
The problem of the monopoly of Japanese photoresist has plagued the development of China's chip industry. In order to reduce dependence on Japan, China's domestic photoresist manufacturers continue to carry out technological innovation and industrial chain optimization. The independent research and development and domestic substitution of the photoresist industry are important ways to solve this problem.
First of all, photoresist manufacturers should strengthen R&D investment and continuously improve their independent innovation capabilities. By optimizing the material combination, additives and formulations of photoresists, as well as improving the purity of materials, the performance and quality of domestic photoresists are improved, and the international advanced level is realized.
Secondly, establish close cooperation with lithography machine manufacturers and chip design enterprises to strengthen collaborative innovation and technical exchanges. As a key link connecting the lithography machine and the chip process, the close cooperation with other links is crucial. By deepening industry-university-research cooperation, we will accelerate the collaborative innovation of photoresist, lithography machine and chip design, and improve the adaptability and reliability of domestic photoresist.
Finally, the state should also increase its support for the photoresist industry. Provide strong support in terms of policies, funds and personnel training, assist photoresist manufacturers to accelerate technological progress and industrial development, and promote the photoresist industry to truly achieve localization.
In the field of photoresist, China's domestic products are gradually breaking through, realizing the domestic substitution of low-end to high-end photoresist. However, continuous efforts are still needed to achieve autonomous and controllable photoresists. Photoresist manufacturers need to strengthen R&D investment, improve independent innovation capabilities, establish close cooperation with lithography machine manufacturers and chip design companies, and promote technical exchanges and collaborative innovation. At the same time, the state should also increase support for the photoresist industry and provide strong support for the development of the photoresist industry. Eventually, through joint efforts, China is expected to achieve a breakthrough in Japan's photoresist monopoly and ensure the sustainable development of its own chip industry.