KT-Z1650PVD is a compact and delicate benchtop sputtering power controllable magnetron sputtering instrument, although small in size, but full of functions, with voltage and current feedback, sample stage rotation, sample height adjustment and motorized baffle functions. By regularly adjusting the pre-sputtering power and thin film deposition power, most metals can be physically deposited uniformly. The vacuum chamber is made of clear quartz glass to reduce sample contamination, while the sample stage can be rotated to obtain a more uniform film. With this instrument, a wide range of metal films can be prepared.
During sputtering, the metal target is bombarded with high-energy particles, producing high-velocity metal ions that are accelerated by an electric field and fly towards the sample surface. On the surface of the sample, the metal ions interact with the electrons, which are accelerated and produce more energetic particles, which then bombard the target, forming a chain reaction that makes the deposited film more uniform and dense.
The control panel of KT-Z1650PVD is designed to be simple and easy to operate. By adjusting the magnitude of voltage and current, it is possible to control the deposition rate of the film and the thickness of the film. At the same time, the rotation and height adjustment of the sample stage can effectively ensure the uniformity of the film.
When using KT-Z1650PVD for metal film preparation, you need to pay attention to the following points. First of all, when installing the sample, it is necessary to ensure that the surface of the sample stage is clean and free of impurities, so as not to affect the quality of the film. Secondly, when adjusting the voltage and current, it is necessary to increase it slowly to avoid instantaneous changes that can lead to cracks or uneven deposition of the film. Finally, when preparing different kinds of metal films, it is necessary to select appropriate parameters such as power and air pressure according to the characteristics of the metal to ensure the quality and performance of the film.
Overall, the KT-Z1650PVD is a full-featured and easy-to-operate magnetron sputterer suitable for the preparation of a wide range of metal films. By rationally adjusting the parameters and controlling the operating process, high-quality, high-performance metallic films can be obtained.