ITO targets, composites composed of indium oxide (In2O3) and tin oxide (SNO2). Indium oxide, as the main component, provides the basic electrical and optical properties of the material, while tin oxide optimizes its conductivity and transparency by fine-tuning the composition ratio.
Indium oxide (In2O3).: The main component of the ITO target, which is responsible for providing good conductivity and transparency. The unique crystal structure has high light transmittance in the visible range, while exhibiting strong absorption in the infrared and ultraviolet spectral regions.
Tin oxide (SNO2).: Only a small fraction of the total composition (usually no more than 10%), but the addition of tin oxide is essential to adjust the electrical properties of the ITO target. Enhancing the conductivity of the material through doping helps to improve its chemical stability and wear resistance.
Raw material preparation and purification process
Selection of high-purity feedstocks: Production begins with the selection of ultra-high-purity indium oxide (In2O3) and tin oxide (SNO2). The purity of these raw materials has a direct impact on the final performance of the ITO target, so the selection of materials must be rigorous.
Sophisticated purification technology: Raw materials are subjected to a multi-stage chemical and physical purification process to remove trace impurities. This step uses sophisticated purification techniques such as solvent extraction, ion exchange, vacuum distillation, etc., to ensure the high purity of the final product.
Mixing, grinding and forming processes
Precisely controlled mixing process: Indium oxide and tin oxide powders are mixed at precise molar ratios. During the mixing process, efficient mechanical agitation or wet chemical methods are used to ensure an even distribution of the two powders.
Advanced grinding technology: The blended powder is further refined through advanced grinding processes, including methods such as ball milling or jet milling, to achieve a more uniform particle size and higher coating rate.
Precision forming process: The ground powder is precisely pressed into the shape of the target. Precise control of pressure, temperature, and time is essential to ensure the density and uniformity of the target in this step.
The sintering process and its effect on the quality of the target
Precise control of sintering conditions: The sintering process takes place at a specific temperature and atmosphere. Temperature, duration, and the choice of atmosphere (e.g., argon or hydrogen) have a significant impact on the microstructure and properties of the final target.
Quality monitoring: Target quality is ensured through real-time monitoring techniques such as thermal analysis and mass spectroscopy throughout the sintering process. These technologies can monitor temperature, atmosphere, and other critical parameters in real-time to ensure that the structure and composition of the target meet standards.
Continuous process optimization
Continuous process innovation: Continuous process innovation is indispensable in order to improve target performance and reduce production costs. This includes the development of new materials, improvements in purification techniques, more efficient mixing and grinding methods, and more advanced sintering technologies.
Total Quality Management: Through a comprehensive quality management system, including strict raw material inspection, process control and finished product inspection, we ensure that each batch of ITO targets meets strict quality standards.
1.Vacuum hot pressing
Process flow: In this method, the mixed ITO powder is placed into a hot pressing mold, heated and pressured in a vacuum environment. The vacuum environment helps prevent oxidation of the material, while hot pressing ensures tight bonding between the powder particles.
Advantages and applications: The targets produced by the vacuum hot pressing method have extremely high density and excellent microstructure consistency, which is suitable for application scenarios that require high performance and low impurity content, such as high-end display technology and precision optoelectronic equipment.
2.Hot isostatic pressing (HIP).
Process: Uniform pressure is applied to the molded body from all directions in a closed environment with high temperature and high pressure. This method can effectively eliminate porosity and defects inside the target.
Advantages and applications: HIP targets generally have higher mechanical strength and uniformity, which is suitable for the manufacture of ITO targets with large size and high uniformity requirements, especially for the production of large-area displays and high-quality solar panels.
3.Atmospheric sintering
Process flow: Sintering in an open air environment, no special pressure environment is required. The powder is sintered at high temperatures, and solidification bindings occur between the particles.
Advantages and applications: Atmospheric sintering is a low-cost production method, and although its density and uniformity may not be as good as other methods, it is still suitable for some standard ITO target manufacturing, such as general electronic and optoelectronic applications.
4.Cold isostatic pressing (CIP).
Process: At room temperature, the powder is pressed in all directions using a liquid medium such as oil or water. This method allows for the preparation of dense targets without the application of heat treatment.
Benefits & Applications: CIP is suitable for the production of targets with complex shapes or large sizes. Although the density may be slightly lower than that of thermoformed targets, it offers better shape freedom and lower cost, making it suitable for special shape requirements or mass production scenarios.
Liquid crystal display (LCD).
Application Background: In liquid crystal display technology, ITO targets are used to fabricate transparent electrodes, which are key to controlling the arrangement of liquid crystal molecules to produce images.
Technical details: The ITO layer must have a high degree of transparency to ensure the clarity of the image, while maintaining sufficient conductivity to efficiently drive liquid crystal molecules. ITO targets exhibit excellent optoelectronic properties in this application.
Market impact: The application of ITO targets in LCD technology has greatly improved display quality and device energy efficiency, and promoted technological innovation in flat-screen TVs, computer monitors and other display devices.
Photovoltaic cells
Background: In the field of solar cells, ITO targets are used to fabricate transparent electrodes that allow light to penetrate and facilitate the collection and transmission of electrical charge.
Technical details: The conductivity and transparency of the ITO layer are essential to improve the efficiency of solar cells. It allows the solar cells to capture more light while efficiently harvesting the current generated.
Sustainable development: The application of ITO targets provides important technical support for the efficiency improvement and cost reduction of solar cells, and has a profound impact on the development of renewable energy technologies.
Functional glass
Application Background: In smart glass and other functional glass products, ITO targets are used to make thin films that can adjust transparency.
Technical details: These glasses change the transmittance of light by changing the charge distribution of the ITO layer, enabling the transition from transparent to opaque. This technology has a wide range of applications in privacy protection, energy conservation, etc.
Innovative applications: Functional glass applications range from building windows to automotive sunroofs and even smart home systems, demonstrating the diverse applications and enormous potential of ITO targets in modern life.