The lithography machine is the core equipment of semiconductor manufacturing, which can engrave the circuit pattern of the chip on the silicon wafer, so as to realize the function of the chip. With the continuous advancement of chip technology, the performance and accuracy of lithography machines must also continue to improve to meet higher process requirements. The first class of lithography machine has also risen, from tens of millions to hundreds of millions, and then to billions in recent years, which has become a sky-high equipment in the semiconductor industry.
Recently, the Dutch lithography machine giant ASML delivered a very special lithography system to the American chip giant Intel, which is the first numerical aperture (NA) extreme ultraviolet (EUV) lithography system delivered by ASML to customers. The cost of this lithography system alone is more than 2.1 billion yuan!
So, what's so special about this lithography machine?Why did Intel spend so much money on it?What kind of changes can it bring to chip manufacturing?Let's uncover its mysteries together!
What is a NA EUV lithography machine?
To understand the NA EUV lithography machine, we must first know what an EUV lithography machine is. EUV lithography machines are made using extreme ultraviolet light (wavelength 135nm) as a light source, which can carve finer linewidths on silicon wafers, resulting in higher integration and performance. EUV lithography is currently the most advanced lithography technology and has been used to make chips for 7nm, 5nm and even 3nm.
However, as chip processes continue to shrink, EUV lithography machines are also facing new challenges. On the one hand, the power and stability of the light source of the EUV lithography machine need to be improved to meet the demand for high outputOn the other hand, the numerical aperture (NA) of the EUV lithography machine also needs to be increased to achieve higher resolution and lower times. The numerical aperture (NA) is an important parameter of the optical system, which represents the angle of incidence of light, and smaller structures can be printed using a larger NA lens.
Currently, ASML's EUV lithography machine has a numerical aperture (NA) of 033. It can achieve a resolution of 13 nanometers, which is suitable for chip manufacturing of 5 nanometers and 3 nanometers. However, if the process is to be scaled down further to 2 nanometers or even 1 nanometer, a higher numerical aperture (NA) is required. As a result, ASML has developed the next generation of EUV lithography machines, the NA EUV lithography machine, which has a numerical aperture (NA) of 055, which can achieve a resolution of 8 nanometers, is the most advanced lithography system at present.
Why should Intel buy a NA EUV lithography machine?
Intel is the world's largest chipmaker and one of ASML's largest customers. Intel has been actively investing in and adopting EUV lithography technology to improve its chip manufacturing capabilities and competitiveness. Intel has already made 10nm and 7nm chips using EUV lithography machines, and plans to launch 5nm chips in 2024.
However, Intel is also facing tremendous pressure and challenges in chip manufacturing. On the one hand, Intel is already lagging behind competitors such as TSMC and Samsung in chip technology, and needs to accelerate its own technological progress and innovation;On the other hand, Intel also has to deal with competition from chip design companies such as Apple, Qualcomm, and Nvidia, and needs to improve the performance and efficiency of its chips. As a result, Intel needs to implement more advanced process nodes, such as 3nm, 2nm, or even 1nm, as soon as possible to stay ahead of the curve.
To achieve this, Intel needed NA EUV lithography machines to create smaller, faster, and more energy-efficient chips. It is reported that Intel has ordered six NA EUV lithography machines from ASML, one of which has been delivered, and the remaining five will be delivered next year. Intel plans to use the NA EUV lithography machine to manufacture its own 18A process, which is Intel's next-generation process and is expected to go into production in 2025. Intel's 18A process will feature new Gate-All-Around (GAA) technology to improve transistor performance and power efficiency.
What changes can NA EUV lithography bring?
The NA EUV lithography machine is the latest advancement in lithography technology, which can bring great changes and advantages to chip manufacturing. First of all, the NA EUV lithography machine is able to achieve higher resolution and lower number of times, resulting in higher integration and performance, breaking the limit of Moore's Law and promoting the progress of chip technology. Secondly, the NA EUV lithography machine can reduce the number of process steps and masks in chip manufacturing, thereby reducing the cost and time of chip manufacturing and improving the yield and quality of chips. Finally, NA EUV lithography machines can increase the flexibility and innovation of chip design, support new transistor designs and chip architectures, and open up new possibilities for chip functions and applications.
In conclusion, the NA EUV lithography machine is a major breakthrough in the semiconductor industry, which will bring revolutionary changes to chip manufacturing and open up new space for chip development and innovation. The collaboration between ASML and Intel also demonstrates the leadership and strategic vision of both companies in the field of lithography technology, and sets an example for the global semiconductor industry. We look forward to seeing more achievements and applications of NA EUV lithography machines, and making greater contributions to the scientific and technological progress and social development of mankind!