The compact benchtop design and simple touchscreen operation make the system ideal for any lab investigating nanoparticle applications.
The vacuum deposition process produces ultra-pure nanoparticles of hydrocarbons or other contaminants, which often plague chemical techniques. The nanoparticle coating is deposited directly on your substrate and is ready for analysis after a typical cycle time of 30 minutesWU requires further drying or purification steps.
The system generates ultrapure and monodisperse nanoparticles in a vacuum, which are then deposited directly onto the target matrix. The NL50 avoids many of the problems faced when working with solution and powder-based nanoparticles.
The system can deposit nanoparticles onto any solid substrate in a matter of minutes. The simple formulation of Zui's commonly used materials allows researchers to deposit exposed nanoparticles, such as AG or AU, onto their substrate and then prepare them for direct functionalization with the desired protein or antibody. The system utilizes a technique called terminating gas aggregation to generate nanoparticles in a vacuum.
Why choose this NL50 nanoparticle deposition system?
Chemically synthesized nanoparticles synthesized by grams have come out, so why invest in equipment to deposit vacuum-phase nanoparticles?The nanoparticles produced in this system are ultra-pure, contain no surfactants or ligands, and are functionalized immediately after deposition, requiring a lengthy and complex multi-step chemical purification process. Nanoparticles are also monodisperse, thus avoiding the problems associated with agglomeration. Real-time control of deposition density ensures reproducible results in a wide range of applications, from monodisperse particles to 3D porous coatings. With this technology, the switching of nanomaterials is also very fast. Unlike chemical synthesis development, which can take months, target materials can be replaced in minutes to deposit a variety of common metals or alloys. Deposition directly onto the substrate means less waste, as only the nanoparticles need to be prepared on demand.
A range of pure and alloyed nanoparticles can be deposited on the customer's samples.
The deposition process is carried out in a vacuum to ensure a controlled WU contamination process.
We provide excellent control over nanoparticle size and area coverage.
The porosity of the nanoparticle film can be optimized to meet the needs of the customer.
We can also provide some standard demo samples for certain materials.
The nanoparticles produced by this nanoparticle deposition system are generated by magnetron sputtering, using a small amount of argon plasma to generate atoms of the desired material.
These atoms are then heated in a very short time (<1 s) and form nanoparticles.
The nanoparticles are injected into the deposition chamber through a small hole and onto the sample.
The user can change the size in the range of around 2-20 nm (depending on the material) by adjusting the plasma power and argon flow.
Real-time deposition control using the Quartz Crystal Monitor (QCM) provides precise and repeatable control of surface loads from submonolithic overlay to porous 3D structures. The deposition time is usually a few minutes. Deposition rates range from 10-50 ng cm2s