dai nippon printing co., ltd.(DNP) (TOKYO: 7912) has successfully developed a photomask fabrication process capable of accommodating 3nm (10-9m) lithography to support extreme ultraviolet (EUV) lithography, a cutting-edge process for semiconductor manufacturing.
Background] DNP continues to meet the performance and quality requirements of semiconductor manufacturers. In 2016, we became the first commercial photomask manufacturer in the world to launch a Multi-Beam Mask Writer (MBMW). In 2020, we developed a photomask manufacturing process suitable for the 5nm EUV lithography process, and have been leading the mask to meet the needs of the semiconductor market. In this latest development, we have developed a photomask for EUV lithography that supports the 3nm process to meet the need for further miniaturization.
Abstract] DNP's MBMW, launched in 2016, is capable of emitting about 260,000 electron beams, significantly reducing lithography time even with complex pattern shapes. This time, we took advantage of the features of the device to improve the manufacturing process, while optimizing the data correction technology and processing conditions to match the complex surface pattern structure of the photomask used for EUV lithography.
DNP has installed the new MBMW and plans to start commissioning in the second half of 2024. We will also strengthen our support for advanced areas of semiconductor manufacturing, such as photomasks for EUV lithography.
DNP will work with the Intercollegiate Center for Microelectronics (IMEC), an international cutting-edge research institute headquartered in Belgium, to advance the development of EUV photomasks for next-generation EUV** devices.
Looking ahead, DNP will provide a newly developed photomask capable of supporting 3nm EUV lithography to global semiconductor-related manufacturers. In addition, we will support the development of peripheral technologies for EUV lithography with the aim of achieving annual sales of 10 billion yen by 2030.
Through joint development with partners such as IMEC, DNP will continue to develop more advanced photomasks to support finer processes at 3nm and even below 2nm.
More details. About DNP
Founded in 1876, DNP has grown into a leading multinational company. We leverage the strengths of print-based solutions and a growing number of partners to create new business opportunities while protecting the environment and creating a more vibrant world for all. With our core competencies in the field of micromachining and precision coating technology, we offer a wide range of products for the display, electronic and optical film markets. We have also developed new products, such as vapor chambers and reflective arrays, to provide next-generation communication solutions and contribute to a more human-centered information society.