Process composition of ultrapure water equipment used in semiconductor production.
In semiconductor production, ultrapure water equipment is indispensable. It provides high-purity water to the production line to meet a variety of process needs. The process composition of ultrapure water equipment mainly includes the following parts:
1. Raw water treatment.
Raw water treatment is the first step in the process of ultrapure water equipment, and the main purpose is to remove impurities and salts from the raw water to ensure the quality of the ultrapure water produced. This step typically includes processes such as sand filtration, activated carbon filtration, and security filters. The sand filter can remove large particles of impurities and suspended solids in the raw water, the activated carbon filter can adsorb organic matter, heavy metals and other harmful substances in the water, and the security filter can further remove the small impurities and particles in the water to ensure the quality of the raw water entering the ultrapure water equipment.
2. Reverse osmosis technology.
Reverse osmosis technology is one of the core processes in ultrapure water equipment. It uses a semi-permeable membrane to allow water to be filtered through a membrane under pressure, thereby removing impurities such as ions, organic matter, bacteria, and microorganisms from the water. Reverse osmosis technology can effectively remove more than 95% of ions and organic matter in the water, providing high-quality feed water for subsequent purification processes.
3. Ion exchange resin.
Ion exchange resins are an important part of ultrapure water equipment, and their main role is to remove residual ions in water. Ion exchange resins are a special type of resin that adsorbs and removes ions as water passes through, bringing water quality to ultra-pure levels. The regeneration process of ion exchange resins is regenerated by acid or alkali solutions to restore the resin's ability to adsorb ions.
4. Membrane distillation technology.
Membrane distillation technology is a new process in ultrapure water equipment, and its main role is to further reduce the residual ions and organic matter in the water. Membrane distillation technology uses a hydrophobic membrane for distillation, allowing water molecules to pass through the membrane and leave impurities, resulting in higher purity ultrapure water. Membrane distillation technology has the advantages of high efficiency and low cost, and has become an important part of ultrapure water equipment.
Fifth, the post-treatment process.
The post-treatment process is the last step in the ultrapure water plant, and the main purpose is to further improve the purity of the water. This step usually includes techniques such as mixed bed, EDI, etc. Mixed beds are made by mixing anion and cation exchange resins together to further remove residual ions from the water through ion exchange. EDI uses an electric field to desalt and sterilize water molecules through a membrane to achieve ultra-pure levels.
In conclusion, ultrapure water equipment used in semiconductor production requires multiple process components, each with its own unique role and function. From raw water treatment, reverse osmosis technology, ion exchange resin, membrane distillation technology to post-treatment process, each link requires strict quality control and technical support to ensure the quality and stability of the ultrapure water produced. These processes work together to produce ultrapure water, providing the high-quality water necessary for semiconductor production.