Japan launched nanoimprint equipment, China researched graphene semiconductors, and the ASML era may be coming to an end?
After decades of changes in traditional lithography technology, Dutch lithography giant ASML is still far ahead of the curve and dominates the world.
However, ASML's monopoly position in the world has become an important means for the United States and other Western countries to wantonly suppress the scientific and technological achievements of other countries in the field of science and technology, which has aroused the dissatisfaction of various countries.
There is no doubt that the world now needs a kind of lithography that can really break the ASML monopoly and break the EUV lithography"The pearl of the industry"chip technology.
So, repeat it three times again: the industrial pearl is urgent! The pearl of industry is in a state of emergency! The pearl of industry is in a state of emergency! The pearl of industry is in a state of emergency! The pearl of industry is in a state of emergency! The industrial pearl is in crisis, and the industrial pearl is in crisis.
Netizens angrily scolded public relations: If you don't work hard, this diamond will fall!
Following the launch of nanoimprint machines in Japan, China has also begun to develop graphene semiconductors to combat lithography technology. Has the ASML era come to an end?
Japanese nanoimprint machine.
Some time ago, the Japanese semiconductor manufacturer Canon released nanoimprint equipment, which can now meet the process technology required for the 5nm process to manufacture the most advanced logic semiconductors. Canon said that the 2 nm process is also expected to be realized in the future due to the improvement of the mask panel.
Nanoimprint technology is a method that uses a substrate to form nanoscale patterns on the surface of semiconductor materials, and has been widely used in the semiconductor field.
Chip lithography is the most important process in the manufacture of integrated circuits, which projects a light source on the photosensitive layer to form the desired pattern.
On the other hand, nanoimprint technology can form nanoscale patterns on the photoresist layer to improve the resolution of the patterns.
The use of nanoimprint technology can achieve high-precision lithography chips, improve chip integration, and improve chip performance. In addition, nanoimprint technology also has the advantages of high efficiency and low cost.
Following Japan, China has made a breakthrough in graphene research.
China has learned from Japan's successful experience in nanoimprint printing and embarked on a new path of localization.
The team from Tianjin University used a special melting method to grow graphene on SiC wafers, and successfully combined graphene with SiC crystals, and achieved important results.
This is also the world's first graphene-based functional semiconductor device, demonstrating China's strength in science and technology.
Graphene is a two-dimensional crystalline material composed of a single layer of carbon atoms, which has excellent electrical, thermal and mechanical properties, and has broad application prospects in the field of semiconductors.
Graphene is widely used in electrodes, masks, sensors and flexible electronic devices due to its good conductivity, high carrier mobility and good chemical stability.
This breakthrough will bring new opportunities for China's future semiconductor device performance improvement and new material research and development.
At present, the team of Maigasa University is still in the stage of theoretical exploration, and there is still a long way to go before large-scale application, but China Chip has taken the first step.
From large planes to small chips, these Western"Industrial pearl"One by one, we were beaten to the ground by us, as well as by ASML, and by other American and Western giants of this era.