Product Overview:
The OTF-1200X-S-HPCVD is a small, open-frame tube furnace that can be moved inside the furnace tube (controlled by a stepper motor).
The outer diameter of the furnace tube is 50mm, and the maximum working temperature of the equipment is 1200.
The position and temperature of the sample stage or conva in the furnace tube are controlled via a touchscreen digital controller.
This device enables rapid heat treatments such as hybrid physicochemical deposition (HPCVD), rapid thermal evaporation (RTE), and horizontal Bridgeman crystal growth (HDC) in a variety of atmospheres for new-generation crystal research.
Product features: The furnace is equipped with a stepper motor, which moves the sample stage or crucible inside the furnace tube via a touchscreen digital controller.
The maximum temperature can reach 1200 °C.
Double-layer shell structure with air cooling system can effectively reduce the surface temperature of the shell.
The surface of the inner furnace is coated with a high-temperature alumina coating imported from the United States, which can improve the heating efficiency of the equipment and prolong the service life of the instrument.
There is the option to retrofit to a dual-zone tubular furnace for an additional fee to produce a higher thermal gradient or a longer constant temperature zone.
Basic parameters: maximum temperature: 1200 (30min) working temperature: 1100 recommended heating rate: 10 min • heating zone length: 200mm • heating element: molybdenum-doped iron-chromium-aluminum alloy Voltage: 220v maximum power is: 2kw temperature control system:
The temperature is adjusted by PID, and 50 levels of temperature rise and fall program can be set • The temperature control instrument is equipped with overheating and couple break protection • The temperature control accuracy of the instrument is +-1° C • Thermocouple model: K type.