The step meter is a very important tool in the characterization and study of semiconductor materials. For example, in the preparation process of semiconductor materials, some key process parameters, such as changes in temperature, pressure, atmosphere and other conditions, will lead to changes in the band structure of semiconductor materialsOr in the production process of semiconductor materials, there are often problems such as uneven doping and excessive impurity content, which will lead to changes in the band structure of the material, thereby affecting the performance of the material.
The CP series step gauge is an ultra-precision contact microscopic profile measuring instrument using a variable differential capacitive sensor LVDC, with a sub-nanometer resolution (0.1nm longitudinal resolution), which is mainly used for the measurement of microscopic morphology parameters such as step height, film thickness, and surface roughness.
Linear variable differential capacitive sensor (LVDC) with sub-angstrom resolution up to 001 angstroms, to meet the measurement accuracy requirements of the measured specimen. The high signal-to-noise ratio and low linearity error enable the product to scan topography features from a few nanometers to hundreds of microns.
50mg adjustable micro force to achieve non-destructive testing of contact measurement;
2. Measure the film thickness or roughness, and avoid the weakness of the optical instrument by not being affected by the image of the transmittance of the substrate
3. It has the function of 3D scanning and imaging display
1.Thickness measurement of thin film materials (2D) and surface topography measurement (3D): The step meter can accurately obtain quantitative step height, line roughness, radius of curvature of the film, and measure the stress of the film.
2.Step height measurement for deposited films: Step meters can be used to measure the step height of deposited films, which is of great significance for ensuring the quality and performance of semiconductor chips.
3.Step height measurement of resist (soft film material): A step meter can be used to measure the step height of resist (soft film material), which is of great significance for evaluating the performance of the resist and selecting the right resist.
4.Etch rate determination: A step meter can be used to measure etch rate, which is important for evaluating the performance of the etching process and optimizing the etching process.
5.CMP (corrosion, dent, bending) measurements: A step meter can be used to measure the effect of CMW (corrosion, dent, bending), which is of great significance for evaluating the performance of CMW processes and optimizing them.
In the semiconductor industry, the roughness of the wafer surface, especially when the wafer surface is oxidized, causes the light transmittance of the oxide layer, and the step meter can be used to obtain accurate and effective values.
Step meter