The Belgian Microelectronics Research Center (IMEC), together with Nippon Chemical Industry and Mitsui Chemicals, a leading manufacturer of extreme ultraviolet (EUV) mask films, today announced the establishment of a strategic partnership to commercialize carbon nanotube (CNT)* thin film technology for extreme ultraviolet (EUV) microimaging applications.
According to imec, Mitsui Chemicals will integrate imec's innovative mask film technology based on carbon nanotubes into Mitsui Chemicals' first-class thin film technology, with the goal of achieving specifications that can be fully put into production, and it is expected to introduce high-power extreme ultraviolet (EUV) systems in 2025-2026. The signing took place in Tokyo during the 2023 Semicon Japan International Semiconductor Show.
imec emphasized that the strategic partnership aims to jointly develop ** thin films and extreme ultraviolet (EUV) mask films, with technical consulting and extreme ultraviolet (EUV)* machine testing by imec and commercial production by Mitsui Chemicals. Designed to protect the reticle from contamination at extreme ultraviolet (EUV)*, these reticle films provide high extreme ultraviolet (EUV) transmittance (94%) and very low extreme ultraviolet (EUV) reflectance with minimal impact**, all of which are critical properties required for advanced semiconductor manufacturing to achieve high yields and high yields. These carbon nanotube (CNT) mask masks can even withstand extreme ultraviolet (EUV) output power in the range of more than 1kW, contributing to the development of a new era of EUV light source technology (above 600W). Manufacturers who are introducing extreme ultraviolet (EUV) microimaging technology in mass production are interested in these features. As a result, the two parties will work together to develop commercially available carbon nanotube (CNT) mask film technology to meet market demand.
Steven Scheer, Senior Vice President of the Advanced Patterning Process and Materials Research Program at imec, said that imec has many years of experience in assisting the semiconductor ecosystem in the development of next-generation microscopic technologies. Since 2015, we have created collaborations with partners across the chain to develop innovative designs for carbon nanotube (CNT) mask shields for advanced extreme ultraviolet (EUV) microimaging technology. We are confident that our in-depth knowledge of measurement, characterization, and properties of carbon nanotube (CNT) thin films will accelerate Mitsui Chemicals' product development." Through this partnership, we hope to advance the production of carbon nanotube (CNT) mask films for the new era of extreme ultraviolet (EUV) microscopic technology. ”
IMEC further noted that under this micro-shadow technology development roadmap, the new reticle film is expected to be launched in 2025-2026, when the new generation of 0The 33 numerical aperture (NA) microscopic system will also be able to support sources with output power in excess of 600W. This development process is related to the introduction of logic chip technology below 2nm.
Header image**: Courtesy of imec).