The world's first NA EUV lithography machine is about to be delivered, with a price tag of more than $2.1 billion.
It will deliver the world's first NA EUV lithography machine with more than $2.1 billion**.
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A new milestone in lithography technology: the first domestic EUV lithography machine with an investment of more than 2.1 billion yuan is about to be put into production.
As we all know, the manufacture of semiconductor chips is inseparable from lithography machines, and the more advanced the lithography machine, the more powerful it is; At present, there are only a handful of manufacturers with the world's top EUV lithography machine manufacturing capacity, mainly monopolized by ASML (Asmail) in the Netherlands, and ASML's most advanced EUV lithography machine is priced at as high as 1 billion yuan, but it is still a scarce product, according to the control of the United States, you can buy everything with money! You may not be able to buy it! Although ASML is able to manufacture advanced EUV lithography equipment at a price of up to 1 billion RMB, we simply cannot purchase it due to the regulations in the United States.
When we were still struggling to buy an EUV lithography machine, ASML from the Netherlands launched a lithography machine, which set a record, and then came good news; The world's first NA-type EUV lithography machine, there are now 6 units, and Intel (Intel) in the United States has bought 6 units, ** to 2.1 billion yuan!
The lithography process has become a critical link in the entire semiconductor industry. The lithography machine is the most critical equipment in the production of integrated circuits, and its process will affect the performance and efficiency of the entire integrated circuit production. Not long ago, the Dutch ASML company made another breakthrough in the field of lithography machine and successfully developed the world's first NA-type extreme ultraviolet lithography machine, which is of great significance to the entire semiconductor industry.
This NA-type EUV lithography technique is claimed to achieve 055 nm or larger numerical aperture and the ability to fabricate chips in a 2nm process. This significant advancement is the result of ASML's continued investment and accumulation of lithography equipment. Compared with traditional EUV lithography, NA-type EUV lithography has significantly improved accuracy, yield, and other parameters, making it a revolution for the entire semiconductor industry.
However, this revolutionary technology has generated a lot of interest in the industry, but it has also brought stiff competition. China is one of the countries with the largest semiconductor industry in the world, but the lithography process has always been restricted by foreign countries. Although some enterprises in China have begun to independently develop lithography technology, there is still a big gap compared with the world's most important high-end products. China needs to continue to strengthen the research and development of key technologies such as lithography and accelerate independent innovation in order to win the fierce competition with other countries in the world.
The world's first Type NA EUV lithography machine finally has a buyer. According to reports, US chip giant Intel Corp. has booked six Type NA EUV lithography machines, which will be put into production in phases in the future. The move not only underscores Intel's commitment to high-end production processes, but also further strengthens its global wafer industry. This reflects the strength of U.S. companies in technological innovation and market competitiveness.
In key technology fields such as lithography, we must improve the level of independent innovation and accelerate the pace of recovery through a series of measures in the face of huge competition from the world's leading companies. First of all, it is necessary to support the semiconductor industry, introduce corresponding policies and special funds, increase technology investment in the semiconductor industry, and improve its technical level. On this basis, we will increase contacts and exchanges with the world's outstanding enterprises, introduce foreign advanced production technology and business philosophy, and accelerate the development of local enterprises.
Secondly, China must further strengthen the integration, cooperation and innovation of the industrial chain to promote the development of China's integrated circuit industry. Lithography technology is a very critical link, and it is necessary to work closely with upstream and downstream manufacturers to solve the main problems. By establishing industry associations and strengthening industry-university-research cooperation, we can build a complete industrial chain and improve the global competitiveness of enterprises.
It is also very important to increase the cultivation and absorption of talents. Lithography technology is a high-tech, high-research, and newly developed process, so there are higher requirements for high-quality professionals. In this document, we believe that we should start from strengthening the construction of disciplines, cultivating company talents, and introducing foreign high-level talents to ensure the normal flow of talents.
Overall, the advent of the world's first NA-type extreme ultraviolet lithography machine is a new milestone in the development of lithography technology. Under the pressure and challenges of international competition, China's semiconductor industry must take the initiative to strengthen independent innovation, improve the integration of the industrial chain and collaborative innovation, strengthen talent training and introduction, and let China's semiconductor industry have a brighter future.