With the continuous development of science and technology, the development of the domestic chip industry is facing a key bottleneck, that isLithography machineTechnology. InasmlReluctant to provide to ChinaImmersion lithography machineand EUVLithography machineIn the case of domestic inability7nmThere is a breakthrough in the following dimensions. However, in recent years, domesticLithography machineNews of technological breakthroughs is not uncommon, and it is said that 28nm is domestically producedLithography machineIt is also close to completion. Then domesticLithography machineTo what extent has the localization of core components progressed?We know,Lithography machineThe process uses a specific wavelength of light to irradiate toPhotoresiston, and then throughPhotoresistThe process of transferring the pattern to a wafer. Lithography machineThe three core components include the light source system, the objective lens system, and the dualWorkbench。In addition, there are other supporting components such as energy detectors and light shields, but this article will focus on the localization progress of these three core components.
First of all, the light source system is:Lithography machineThese include ARF and Immersion ARFILithography machineThe light source used at a wavelength of 193 nm is also known as deep ultraviolet light. Currently Shanghai Microelectronics 90nm lithography machineThe light source of 193nm has been used, withImmersion lithography machineThe same can be supported up to7nmof the process. The localization of the light source system is relatively well developed in EUVLithography machineBefore the emergence of the country, it was already able to develop independentlyLithography machineThe required light source system.
Next up is the objective system, which isLithography machineThe most challenging part, rightOpticsThe level requirements are extremely high. For nowasmlThe objective lens system used is made by the best in the worldOpticsCompany CarlZEISSProvided, CarlZEISSYesasmlThe only objective lens supplier, providing lenses, mirrors, illuminators, collectors and other keysOpticsComponent. Currently domesticLithography machineThe objective lens system used is still stuck at the 90nm process node, but it is said that the objective lens system of Changchun Optoelectronics Institute has reached 32nm, but it is unclear whether it has been appliedLithography machineAbove. It can be seen that domestic enterprises in the objective lens system with theasmlThere is still a big gap, which is also a restriction on domestic productionLithography machineOne of the important factors of the breakthrough.
Finally, there are doublesWorkbench, which involves competencies in mechanical, automated, and precision instrumentation. asmlofLithography machineIt can maintain an accuracy of 2nm under high-speed movement, and there was a report earlier in China that Tsinghua University and Huazhuo Jingke jointly developed itLithography machineDoubleWorkbenchThe accuracy is 10nm, although it is not as goodasmlof 2nm, but already quite considerable. In addition, aboutImmersion lithography machine, which involves the control system of the wetting solution, also tests the ability of sensors and instrument control. At present, it has not been reported in ChinaImmersion lithography machinenews of the breakthrough, but allegedly domestic enterprisesQier ElectromechanicalA major breakthrough has been made in the immersion control system, but the specific progress is unknown.
To sum up, domesticLithography machineThe development is not as difficult as imagined, and domestic enterprises are gradually breaking through. Although in terms of objective lens system withasmlThere is still a gap compared to the light source system and dualWorkbenchThe progress of localization is still worthy of recognition. With the continuous efforts and breakthroughs of domestic enterprises, we believe in domestic productionImmersion lithography machineIt's not far from us.
In general, domesticLithography machineThe development of the industry still faces certain challenges, but through continuous innovation and progress, we believe in domestic productionLithography machineThere will definitely be a place. As Thomas Edison once said, "Genius is one percent diligence and ninety-nine percent perspiration." "Only by continuous efforts and breakthroughs can we achieve domestic productionLithography machineThe take-off of the industry has made greater contributions to the development of China's chip industry. Let's look forward to the presence of domestic enterprisesLithography machineGreater breakthroughs and innovations in technology!